김은규 민석기 염상섭 손맹호 한영기 왕채현 2024-01-21T19:37:59Z 2024-01-21T19:37:59Z 2022-01-10 1996-04 https://pubs.kist.re.kr/handle/201004/144483 Post-growth annealing effects of low-temperature grown TiO//2 thin films on InP substrate by low-pressure metalorganic chemical vapor deposition. Article 3 J. appl. phys., v.v. 79, no.no. 8, pp.4459 - 4461 J. appl. phys. v. 79 no. 8 4459 4461 post-growth annealing