송종한 D. Y. C. Lie N. D. Theodore 2024-01-21T19:41:22Z 2024-01-21T19:41:22Z 2022-01-10 1996-02 0169-4332 https://pubs.kist.re.kr/handle/201004/144541 Elsevier BV Dopant activation and strain relaxation in P-implanted metastable pseudomorphic Ge//0//.//1//2Si//0//.//8//8 grown on Si(100). Article 3 Applied Surface Science, v.v. 92, pp.557 - 565 Applied Surface Science v. 92 557 565 N