Ahn, KD Koo, JS Chung, CM 2024-01-21T19:42:14Z 2024-01-21T19:42:14Z 2022-01-11 1996-01-30 0887-624X https://pubs.kist.re.kr/handle/201004/144556 Three sulfonyloxymaleimides (RsOMI), N-(tosyloxy)maleimide (TsOMI), N-(methane-sulfonyloxy) maleimide (MsOMI), and N- (trifluoromethanesulfonyloxy)maleimide (TfOMI), have been synthesized and used to make novel photoacid generating polymers. The sulfonyloxymaleimides easily copolymerized with styrene derivatives to give high molecular weight polymers having an alternating structure of both monomer units. Terpolymers based on RsOMI and p-(tert-butyloxycarbonyloxy) styrene (t-BOCSt) were prepared for enhancing resist properties such as adhesion to substrates, solubility in aqueous alkaline solutions, or transparency in the deep-UV region. The RsOMI copolymers were found to produce corresponding sulfonic acids (RsOH), TsOH, MsOH, and TfOH, by deep-UV irradiation in the film state. Thus, the polymers having both the RsOMI and t-BOCSt units show the capability of a single-component, chemically amplified resist system in the deep-UV region without addition of any photoacid generator. Positive- and negative-tone images were obtained by exposure of the polymer films to deep-UV and post-exposure bake followed by development with organic solvents or aqueous alkaline solutions. (C) 1996 John Wiley & Sons, Inc. English JOHN WILEY & SONS INC DEEP COPOLYMERS Photoacid generating polymers based on sulfonyloxymaleimides and application as single-component resists Article 10.1002/(SICI)1099-0518(19960130)34:2<183::AID-POLA4>3.0.CO;2-V 1 JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, v.34, no.2, pp.183 - 191 JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY 34 2 183 191 scie scopus A1996TM42600008 2-s2.0-0029779501 Polymer Science Polymer Science Article DEEP COPOLYMERS N-(tosyloxy)maleimide N-(methanesulfonyloxy)maleimide N-(trifluoromethanesulfonyloxy)maleimide photoacid generating polymer single-component resist