고석근 윤경렬 김석 최두진 김기환 2024-01-21T20:02:42Z 2024-01-21T20:02:42Z 2022-01-10 1996-01 https://pubs.kist.re.kr/handle/201004/144671 Chemical vapor deposition of copper films : influence of the seeding layers. Article 3 Mat. res. soc. proc., v.v. 427, pp.225 - ? Mat. res. soc. proc. v. 427 225 ?