송종한 D. Y. C. Lie F. Eisen M. A. Nicolet 2024-01-21T20:06:01Z 2024-01-21T20:06:01Z 2022-01-10 1996-01 https://pubs.kist.re.kr/handle/201004/144728 Strain evolution and dopant activation in P-implanted metastable pseudomorphic Si(100)/Ge//0//.//1//2Si//0//.//8//8. Article 3 Journal of electronic materials, v.v. 25, no.no.1, pp.87 - 92 Journal of electronic materials v. 25 no.1 87 92 dopant activation