고석근 윤영수 정형진 김기환 이지현 2024-01-21T20:09:38Z 2024-01-21T20:09:38Z 2022-01-10 1996-01 https://pubs.kist.re.kr/handle/201004/144790 Room temperature growth of Cu thin film by nozzle-type partially ionized beam deposition with various acceleration voltages. Article 3 Thin solid films, v.v. 278, pp.45 - 48 Thin solid films v. 278 45 48 deposition process