Chung, C.-M. Ahn, K.-D. 2024-01-21T20:14:15Z 2024-01-21T20:14:15Z 2021-09-02 1996-01 0914-9244 https://pubs.kist.re.kr/handle/201004/144868 [No abstract available] English Tokai University Photochemical acid generation and resist application of camphorsulfonyloxymaleimide copolymers Article 10.2494/photopolymer.9.553 1 Journal of Photopolymer Science and Technology, v.9, no.4, pp.553 - 556 Journal of Photopolymer Science and Technology 9 4 553 556 scopus 2-s2.0-0345119736 Article