LIE, DYC THEODORE, ND SONG, JH NICOLET, MA 2024-01-21T20:40:39Z 2024-01-21T20:40:39Z 2021-09-01 1995-05-15 0021-8979 https://pubs.kist.re.kr/handle/201004/145080 English AMER INST PHYSICS SI1-XGEX ALLOY LAYERS ION-IMPLANTATION DAMAGE PRODUCTION SI SILICON STRAIN SUPERLATTICES KINETICS STRESS FILMS SOLID-PHASE EPITAXIAL REGROWTH AND DOPANT ACTIVATION OF P-IMPLANTED METASTABLE PSEUDOMORPHIC GE0.12SI0.88 ON SI(100) Article 10.1063/1.359261 1 JOURNAL OF APPLIED PHYSICS, v.77, no.10, pp.5160 - 5166 JOURNAL OF APPLIED PHYSICS 77 10 5160 5166 scie scopus A1995QY83900043 Physics, Applied Physics Article SI1-XGEX ALLOY LAYERS ION-IMPLANTATION DAMAGE PRODUCTION SI SILICON STRAIN SUPERLATTICES KINETICS STRESS FILMS