LEE, DH CHO, YS YI, WI KIM, TS LEE, JK JUNG, HJ 2024-01-21T20:46:07Z 2024-01-21T20:46:07Z 2021-09-02 1995-02-13 0003-6951 https://pubs.kist.re.kr/handle/201004/145172 English AMER INST PHYSICS METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF TIO2-N ANATASE THIN-FILM ON SI SUBSTRATE Article 10.1063/1.113430 1 APPLIED PHYSICS LETTERS, v.66, no.7, pp.815 - 816 APPLIED PHYSICS LETTERS 66 7 815 816 scie scopus A1995QG23200012 2-s2.0-36449007803 Physics, Applied Physics Article chemical vapor deposition TiO2 anatase X-ray photoelectron spectroscopy