박달근 전병수 이중기 신세희 2024-01-21T21:46:26Z 2024-01-21T21:46:26Z 2022-01-10 1994-01 https://pubs.kist.re.kr/handle/201004/145728 Preparation of large area TiO2 thin films by low pressure chemical vapor deposition Article 3 한국재료학회지, v.24, no.8, pp.861 - 869 한국재료학회지 24 8 861 869 CVD titanium dioxide thin film