KIM, TS OH, MH KIM, CH 2024-01-21T22:32:13Z 2024-01-21T22:32:13Z 2022-01-10 1993-06 0021-4922 https://pubs.kist.re.kr/handle/201004/146039 Nearly stoichiometric ((Ba+Sr)/Ti=1.08-1.09) and optically transparent (BaSr)TiO3 thin films were deposited on an indium tin oxide (ITO)-coated glass substrate by means of rf magnetron sputtering for their application to the insulating layer of an electroluminescent flat panel display. The influence of the ITO layer on the properties of (BaSr)TiO3 thin films deposited on the ITO-coated substrate was investigated. The ITO layer did not affect the crystallographic orientation of (BaSr)TiO3 thin film, but enhanced the grain growth. Another effect of the ITO layer on (BaSr)TiO3 thin films was the interdiffusion phenomenon, which was studied by means of secondary ion mass spectrometry (SIMS). As the substrate temperature increased, interdiffusion intensified at the interface not only between the grown film and ITO layer but also between the ITO layer and base glass substrate. The refractive index (n(f)) of (BaSr)TiO3 thin film deposited on a bare glass substrate was 2.138-2.286, as a function of substrate temperature. English JAPAN J APPLIED PHYSICS BATIO3 SILICON INFLUENCES OF INDIUM TIN OXIDE LAYER ON THE PROPERTIES OF RF MAGNETRON-SPUTTERED (BASR)TIO3 THIN-FILMS ON INDIUM TIN OXIDE-COATED GLASS SUBSTRATE Article 10.1143/JJAP.32.2837 1 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.32, no.6A, pp.2837 - 2841 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 32 6A 2837 2841 scie scopus A1993LL78500050 2-s2.0-0027610064 Physics, Applied Physics Article BATIO3 SILICON THIN FILM RF MAGNETRON SPUTTERING (BASR)TIO3 ITO-COATED GLASS SUBSTRATE INSULATING FILM