양승관 박찬언 안광덕 2024-01-21T22:32:52Z 2024-01-21T22:32:52Z 2022-01-10 1993-05 0379-153X https://pubs.kist.re.kr/handle/201004/146050 Korean 한국고분자학회 Sulfonate 광산발생제를 사용하는 화학증폭 포토레지스트의 Catalytic chain length 및 특성곡선 Catalytic chain length and characteristic curve in a chemical amplification photoresist using sulfonate photoacid generator Article 2 폴리머, v.17, no.3, pp.335 - 340 폴리머 17 3 335 340 N other catalytic chain length deep UV photoresists photoacid generator pyrogallol tris(methane sulfonate) t-BOC-protected phosphazene dissolution inhibition chemical amplification resist