염상섭 윤영수 W. N. Kang H. S. Shin T. W. Kim J. H. Lee D. J. Choi S. S. Back 2024-01-21T22:36:35Z 2024-01-21T22:36:35Z 2022-01-10 1993-02 https://pubs.kist.re.kr/handle/201004/146111 Structural properties of BaTiO3 thin films on Si grown by metalorganic chemical vapor deposition Article 3 Journal of applied physics, v.73, no.3, pp.1547 - 1547 Journal of applied physics 73 3 1547 1547 thin films BaTiO3 MOCVD