HAN, IK LEE, YJ LEE, JI KANG, KN KIM, SY 2024-01-21T23:03:25Z 2024-01-21T23:03:25Z 2022-01-11 1992-12-15 0261-8028 https://pubs.kist.re.kr/handle/201004/146336 English CHAPMAN HALL LTD SILICON-NITRIDE SPECTROSCOPIC ELLIPSOMETRIC MEASUREMENTS OF PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION-GROWN SINXINP STRUCTURE Article 10.1007/BF00736210 1 JOURNAL OF MATERIALS SCIENCE LETTERS, v.11, no.24, pp.1689 - 1691 JOURNAL OF MATERIALS SCIENCE LETTERS 11 24 1689 1691 scie scopus A1992KD45100019 2-s2.0-34249843370 Materials Science, Multidisciplinary Materials Science Article SILICON-NITRIDE