주병권 오명환 차균현 2024-01-21T23:17:20Z 2024-01-21T23:17:20Z 2022-01-10 1992-01 https://pubs.kist.re.kr/handle/201004/146566 Observation of oxide film formed at Si-Si bonding interface in SFB process SFB 공정시 Si-Si 접합 계면에 형성되는 산화막의 관찰 Article 3 전자공학회논문지, v.29A, no.1, pp.41 - 47 전자공학회논문지 29A 1 41 47 micromachining wafer direct bonding interfacial oxide