HAN, IK LEE, YJ JO, JH LEE, JI KANG, KN 2024-01-21T23:44:33Z 2024-01-21T23:44:33Z 2022-01-11 1991-05-01 0261-8028 https://pubs.kist.re.kr/handle/201004/146796 English CHAPMAN HALL LTD FILMS HEATING EFFECT IN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE Article 10.1007/BF00726926 1 JOURNAL OF MATERIALS SCIENCE LETTERS, v.10, no.9, pp.526 - 528 JOURNAL OF MATERIALS SCIENCE LETTERS 10 9 526 528 scie scopus A1991FL47200013 2-s2.0-34249924841 Materials Science, Multidisciplinary Materials Science Article FILMS