김용태 민석기 홍종성 김충기 2024-01-22T00:01:50Z 2024-01-22T00:01:50Z 2022-01-10 1991-01 https://pubs.kist.re.kr/handle/201004/146861 Plasma enhanced chemical vapor deposition of low-resistive tungsten thin films. Article 3 Appl. phys. lett., v.v. 58, pp.837 - 839 Appl. phys. lett. v. 58 837 839