조성욱 이경우 조영환 윤종규 2024-01-22T00:13:39Z 2024-01-22T00:13:39Z 2022-01-10 1990-09 https://pubs.kist.re.kr/handle/201004/147056 Effects of fluid flow on the chemical vapor deposition of Si in the system SiH//4-H//2. SiH//4-H//2 계에서 유체유동이 Si 의 화학증착에 미치는 영향 = Article 3 한국표면공학회지 = Journal of the Korean institute of surface engineering, v.v. 23, no.no. 3, pp.160 - 165 한국표면공학회지 = Journal of the Korean institute of surface engineering v. 23 no. 3 160 165 chemical vapor deposition numerical simulation thin film fluid flow