안광덕 2024-01-22T00:34:58Z 2024-01-22T00:34:58Z 2022-01-10 1990-01 https://pubs.kist.re.kr/handle/201004/147187 Chemical modification of PMIPK resist. Article 3 Polymers for microelectronics-science and technology, pp.269 - 281 Polymers for microelectronics-science and technology 269 281 poly(methyl isopropenyl ketone) [PMIPK] PMIPK-oxime photosensitizer photosensitivity photodegradation side-chain modification polymer reaction photoresist