김용태 민석기 홍종성 김충기 2024-01-22T00:35:16Z 2024-01-22T00:35:16Z 2022-01-10 1990-01 0374-4884 https://pubs.kist.re.kr/handle/201004/147192 Korean Physical Society Characteristics of plasma enhanced chemical vapor deposition tungsten thin films. Article 2 Journal of the Korean Physical Society, v.23, pp.511 - 517 Journal of the Korean Physical Society 23 511 517