김용태 민석기 홍종성 염상섭 홍치유 김충기 2024-01-22T00:38:20Z 2024-01-22T00:38:20Z 2022-01-10 1990-01 https://pubs.kist.re.kr/handle/201004/147243 Effects of SiH//4 on resistivity of plasma enhanced chemical vapor deposition tungsten thin films. Article 3 Journal of the Korean Physical Society, v.v. 23, pp.518 - 522 Journal of the Korean Physical Society v. 23 518 522 thin films SiH//4 CVD