CHO, HY KIM, EK MIN, SK 2024-01-22T00:41:59Z 2024-01-22T00:41:59Z 2022-01-10 1989-10-01 0021-8979 https://pubs.kist.re.kr/handle/201004/147302 English AMER INST PHYSICS A RELATION BETWEEN EL2 (EC-0.81 EV) AND EL6 (EC-0.35 EV) IN ANNEALED HB-GAAS BY HYDROGEN PLASMA EXPOSURE Article 10.1063/1.344189 1 JOURNAL OF APPLIED PHYSICS, v.66, no.7, pp.3038 - 3041 JOURNAL OF APPLIED PHYSICS 66 7 3038 3041 scie scopus A1989AQ96400038 Physics, Applied Physics Article EL2 EL6 HB-GaAs hydrogen plasma