김용태 민석기 2024-01-22T01:13:32Z 2024-01-22T01:13:32Z 2022-01-10 1988-01 https://pubs.kist.re.kr/handle/201004/147608 A stydy on the necleation, growth and shrinkage of oxidation induced stacking faults(OSF);-part II : Role of SiO//2 layer on the shrinkage of oxidation induced stacking faults(OSF) in P-type CZ silico Article 3 J. Kor. inst. telem. elec., v.v. 25, pp.767 - 772 J. Kor. inst. telem. elec. v. 25 767 772