김용태 김춘근 민석기 2024-01-22T01:15:22Z 2024-01-22T01:15:22Z 2022-01-10 1988-01 https://pubs.kist.re.kr/handle/201004/147637 Effect of flow rate ratios of SiH//4/NH//3/N//2 and SiH//4/NH//3/Ar on the properties of PECVD SiN//x:H films. Article 3 J. Kor. inst. telem. elec., v.v. 25, pp.490 - 494 J. Kor. inst. telem. elec. v. 25 490 494