Cho, Junghyun Oh, Jinwoo Bang, Joona Koh, Jai Hyun Jeong, Hoon Yeub Chung, Seungjun Son, Jeong Gon 2024-01-25T05:01:02Z 2024-01-25T05:01:02Z 2024-01-25 2023-12 https://pubs.kist.re.kr/handle/201004/148465 The shear-rolling process is a promising directed self-assembly method that can produce high-quality sub-10 nm block copolymer line-space patterns cost-effectively and straightforwardly over a large area. This study presents a high temperature (280 degree celsius) and rapid (similar to 0.1 s) shear-rolling process that can achieve a high degree of orientation in a single process while effectively preventing film delamination, that can be applied to large-area continuous processes. By minimizing adhesion, normal forces, and ultimate shear strain of the polydimethylsiloxane pad, shearing was successfully performed without peeling up to 280 degree celsius at which the chain mobility significantly increases. This method can be utilized for various high-chi block copolymers and surface neutralization processes. It enables the creation of block copolymer patterns with a half-pitch as small as 8 nm in a unidirectional way. Moreover, the 0.1-second rapid shear-rolling was successfully performed on long, 3-inch width polyimide flexible films to validate its potential for the roll-to-roll process. English Nature Publishing Group Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatterns Article 10.1038/s41467-023-43766-2 1 Nature Communications, v.14, no.1 Nature Communications 14 1 Y scie scopus 001127589400024 2-s2.0-85180264046 Multidisciplinary Sciences Science & Technology - Other Topics Article GRAPHOEPITAXY LITHOGRAPHY BLOCK-COPOLYMER FILMS THIN-FILMS ORIENTATION ALIGNMENT