Kim Yong Tae 이창우 2024-02-21T05:09:04Z 2024-02-21T05:09:04Z 1995-01 https://pubs.kist.re.kr/handle/201004/148891 Nitrogen ion mixed tungsten thin films for metal-organic chemical vapor deposited Cu metallization. Nitrogen ion mixed tungsten thin films for metal-organic chemical vapor deposited Cu metallization. Book 910 913 Ion implantation technology-94