Kim Yong Tae S. K. Kwak C. S. Kwon D. J. Kim C. W. Lee I. H. Choi Min Suk-Ki 2024-02-21T05:09:06Z 2024-02-21T05:09:06Z 1995-01 https://pubs.kist.re.kr/handle/201004/148892 New concept for amorphous diffusion barrier: Ion beam modification of metal/semiconductor interface. New concept for amorphous diffusion barrier: Ion beam modification of metal/semiconductor interface. Book ? ? 한국물리학회 제 71 회 학술논문발표회