Han, Kyu Hyun Kim, Seung-Hwan Kim, Jong-Hyun Yu, Hyun-Yong 2024-12-06T10:00:42Z 2024-12-06T10:00:42Z 2024-12-06 2025-04 1616-301X https://pubs.kist.re.kr/handle/201004/151311 For upcoming AI computing era, the multi-valued logic (MVL) is promising for processing multiple information with high-density device. Particularly, the negative differential transconductance (NDT) devices as element of MVL have been needed to overcome complicated heterostructures with multiple stacking process. Herein, the single-channel device is developed with NDT phenomenon through plasma treatment in van der Waals (vdW) transistor. The O2 plasma treatment formed amorphous oxidation layer capable of charge transfer on vdW materials. Through O2 plasma treatment on single-channel, the NDT phenomenon is implemented by forming the multiple VTH in single-channel electrical curve due to charge transfer p-doping effect. The peak-to-valley current ratio (PVCR) of NDT phenomenon is achieved to 102. Furthermore, ternary inverter is demonstrated in single-channel combined with NDT and load device. Finally, by implementing NDT peak in single-channel transistor, the complexity and size of MVL circuit is reduced, moving away multiple heterostructure. English John Wiley & Sons Ltd. Plasma Treatment Induced Charge Transfer for Realization of Negative Differential Transconductance in Van Der Waals Single-Channel Article 10.1002/adfm.202420666 1 Advanced Functional Materials, v.35, no.15 Advanced Functional Materials 35 15 N scie scopus 001364557900001 Chemistry, Multidisciplinary Chemistry, Physical Nanoscience & Nanotechnology Materials Science, Multidisciplinary Physics, Applied Physics, Condensed Matter Chemistry Science & Technology - Other Topics Materials Science Physics Article MULTIVALUED LOGIC DEVICE TRANSISTOR multi-valued logic negative differential transconductance peak-to-valley current ratio single-channel van der Waals