Jung, Soo Young Han, Dong-Hun Ning, Ruiguang Kim, Min-Seok Choi, Hyung-Jin Jang, Ho Won Baek, Seung-Hyub 2025-01-23T06:30:23Z 2025-01-23T06:30:23Z 2025-01-23 2024-12 2226-4108 https://pubs.kist.re.kr/handle/201004/151644 This review provides an in-depth exploration of low-damage sputtering techniques and their importance in synthesizing high-quality epitaxial multifunctional oxide heterostructures. This review examines the factors contributing to damages during sputtering and introduces strategies for minimizing these detrimental effects. Prominent examples are provided to illustrate key milestones in the development of the sputtering technique, addressing critical issues such as maintaining stoichiometry when volatile species are included, achieving precise atomic-level control of interfaces, integrating an additional anion into oxides, selecting a particular phase from many possible polymorphs, and controlling the microstructure of thin films. Additionally, various defect mitigation strategies are discussed, including the use of miscut substrates, in-situ monitoring systems, and chemical buffer layers. By shedding light on the advancements and limitations in sputtering, this review not only enhances our present understanding of thin film deposition but also paves the way for future innovative sputtering techniques, holding tremendous potential for the exploration of new materials and their applications in various industries. English Springer Science + Business Media Extreme sputtering: Epitaxy of multifunctional oxides heterostructures Article 10.26599/JAC.2024.9220988 1 Journal of Advanced Ceramics, v.13, no.12, pp.1919 - 1930 Journal of Advanced Ceramics 13 12 1919 1930 Y scie scopus 001394133400001 Materials Science, Ceramics Materials Science Review YBA2CU3O7 THIN-FILMS DEPOSITION GROWTH AR sputtering low damage ion bombardment epitaxial thin films functional oxides