Singh, Jitendra Pal Kumar, Manish Lim, Weon Cheol Gautam, Sanjeev Kandasami, Asokan Lee, Sangsul Chae, Keun Hwa 2025-04-11T02:00:29Z 2025-04-11T02:00:29Z 2025-04-09 2025-02 1229-7607 https://pubs.kist.re.kr/handle/201004/152263 The present study investigates the local electronic structures of amorphous thin films before and after 100 MeV O 7+ ion irradiation by using the angle-dependent near-edge X-ray absorption fine structure (NEXAFS) measurements at O and Mg K -edges. X-ray diffraction study reveals that as-grown film is amorphous in nature and it remains unaltered after ion irradiation. Post-irradiated film exhibits the onset of surface modifications as revealed from X-ray reflectivity measurements. The spectral features appearing in O K - and Mg K -edge NEXAFS measurements for pristine and irradiated films exhibit the characteristics of MgO. Less intense spectral features in the irradiated thin films are evident due to distortion in Mg 2+ ion coordination induced by the bombardment of 100 MeV O 7+ ions. English 한국전기전자재료학회 Probing Local Electronic Structure of Amorphous MgO Thin Films by Angle Dependent Soft X-ray Absorption Spectroscopy: Impact of Heavy Ions Article 10.1007/s42341-024-00582-9 2 Transactions on Electrical and Electronic Materials, v.26, no.1, pp.18 - 28 Transactions on Electrical and Electronic Materials 26 1 18 28 N kci ART003174049 2-s2.0-85212228194 Ion Irradiation Coordination NEXAFS Surface Modification