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<dublin_core schema="dc">
<dcvalue element="contributor" qualifier="author">Lee,&#x20;Sein</dcvalue>
<dcvalue element="contributor" qualifier="author">Jang,&#x20;Yoonseo</dcvalue>
<dcvalue element="contributor" qualifier="author">Ham,&#x20;Wooho</dcvalue>
<dcvalue element="contributor" qualifier="author">Bae,&#x20;Jonghyun</dcvalue>
<dcvalue element="contributor" qualifier="author">Kim,&#x20;Kyunghwan</dcvalue>
<dcvalue element="contributor" qualifier="author">Park,&#x20;Jeong-Min</dcvalue>
<dcvalue element="contributor" qualifier="author">Lee,&#x20;Junseo</dcvalue>
<dcvalue element="contributor" qualifier="author">Song,&#x20;Min-Kyu</dcvalue>
<dcvalue element="contributor" qualifier="author">Jung,&#x20;Dohwan</dcvalue>
<dcvalue element="contributor" qualifier="author">Sultane,&#x20;Prakash&#x20;R.</dcvalue>
<dcvalue element="contributor" qualifier="author">Han,&#x20;Jae-Hoon</dcvalue>
<dcvalue element="contributor" qualifier="author">Bielawski,&#x20;Christopher&#x20;W.</dcvalue>
<dcvalue element="contributor" qualifier="author">Oh,&#x20;Jungwoo</dcvalue>
<dcvalue element="contributor" qualifier="author">Kwon,&#x20;Jang-Yeon</dcvalue>
<dcvalue element="date" qualifier="accessioned">2025-05-11T05:31:17Z</dcvalue>
<dcvalue element="date" qualifier="available">2025-05-11T05:31:17Z</dcvalue>
<dcvalue element="date" qualifier="created">2025-05-07</dcvalue>
<dcvalue element="date" qualifier="issued">2025-04</dcvalue>
<dcvalue element="identifier" qualifier="issn">1530-6984</dcvalue>
<dcvalue element="identifier" qualifier="uri">https:&#x2F;&#x2F;pubs.kist.re.kr&#x2F;handle&#x2F;201004&#x2F;152407</dcvalue>
<dcvalue element="description" qualifier="abstract">Atomic&#x20;layer&#x20;deposition-grown&#x20;beryllium&#x20;oxide&#x20;(BeO)&#x20;is&#x20;gaining&#x20;attention&#x20;as&#x20;a&#x20;dielectric&#x20;material&#x20;that&#x20;can&#x20;minimize&#x20;device&#x20;power&#x20;consumption&#x20;because&#x20;of&#x20;its&#x20;high&#x20;dielectric&#x20;constant,&#x20;high&#x20;thermal&#x20;conductivity,&#x20;and&#x20;low&#x20;leakage&#x20;current&#x20;enabled&#x20;by&#x20;its&#x20;wide&#x20;bandgap&#x20;energy.&#x20;In&#x20;this&#x20;study,&#x20;the&#x20;impact&#x20;of&#x20;BeO&#x20;dielectrics&#x20;on&#x20;InSnZnO&#x20;(ITZO)&#x20;thin-film&#x20;transistors&#x20;(TFTs)&#x20;was&#x20;investigated,&#x20;revealing&#x20;that&#x20;adding&#x20;a&#x20;hafnium&#x20;dioxide&#x20;(HfO2)&#x20;layer&#x20;can&#x20;enhance&#x20;electrical&#x20;performance&#x20;and&#x20;bias&#x20;stress&#x20;reliability.&#x20;Time-of-flight&#x20;secondary-ion&#x20;mass&#x20;spectrometry&#x20;and&#x20;X-ray&#x20;photoelectron&#x20;spectroscopy&#x20;confirmed&#x20;that&#x20;the&#x20;single-BeO&#x20;dielectric-based&#x20;ITZO&#x20;TFTs&#x20;exhibited&#x20;a&#x20;low&#x20;mobility&#x20;of&#x20;27.6&#x20;cm(2)&#x2F;V&lt;middle&#x20;dot&gt;s&#x20;due&#x20;to&#x20;Be&#x20;migration&#x20;and&#x20;demonstrated&#x20;abnormal&#x20;threshold&#x20;voltage&#x20;(V-TH)&#x20;shifts&#x20;under&#x20;bias&#x20;stress.&#x20;Conversely,&#x20;the&#x20;HfO2&#x20;20&#x20;nm&#x2F;BeO&#x20;hetero-dielectric&#x20;ITZO&#x20;TFTs&#x20;exhibited&#x20;a&#x20;high&#x20;mobility&#x20;of&#x20;76.6&#x20;cm(2)&#x2F;V&lt;middle&#x20;dot&gt;s&#x20;and&#x20;enhanced&#x20;abnormal&#x20;V-TH&#x20;shift&#x20;characteristics.&#x20;Therefore,&#x20;these&#x20;results&#x20;demonstrate&#x20;that&#x20;our&#x20;high-performance&#x20;HfO2&#x2F;BeO&#x20;hetero-dielectric-based&#x20;ITZO&#x20;TFTs&#x20;could&#x20;be&#x20;utilized&#x20;in&#x20;back-end-of-line&#x20;devices&#x20;for&#x20;monolithic&#x20;three-dimensional&#x20;memory&#x20;technologies.</dcvalue>
<dcvalue element="language" qualifier="none">English</dcvalue>
<dcvalue element="publisher" qualifier="none">American&#x20;Chemical&#x20;Society</dcvalue>
<dcvalue element="title" qualifier="none">High-Performance&#x20;Oxide&#x20;Thin-Film&#x20;Transistors&#x20;with&#x20;Atomic&#x20;Layer&#x20;Deposition-Grown&#x20;HfO2&#x2F;BeO&#x20;Hetero-Dielectric</dcvalue>
<dcvalue element="type" qualifier="none">Article</dcvalue>
<dcvalue element="identifier" qualifier="doi">10.1021&#x2F;acs.nanolett.5c00552</dcvalue>
<dcvalue element="description" qualifier="journalClass">1</dcvalue>
<dcvalue element="identifier" qualifier="bibliographicCitation">Nano&#x20;Letters,&#x20;v.25,&#x20;no.17,&#x20;pp.6975&#x20;-&#x20;6982</dcvalue>
<dcvalue element="citation" qualifier="title">Nano&#x20;Letters</dcvalue>
<dcvalue element="citation" qualifier="volume">25</dcvalue>
<dcvalue element="citation" qualifier="number">17</dcvalue>
<dcvalue element="citation" qualifier="startPage">6975</dcvalue>
<dcvalue element="citation" qualifier="endPage">6982</dcvalue>
<dcvalue element="description" qualifier="isOpenAccess">N</dcvalue>
<dcvalue element="description" qualifier="journalRegisteredClass">scie</dcvalue>
<dcvalue element="description" qualifier="journalRegisteredClass">scopus</dcvalue>
<dcvalue element="identifier" qualifier="wosid">001472080000001</dcvalue>
<dcvalue element="identifier" qualifier="scopusid">2-s2.0-105002869152</dcvalue>
<dcvalue element="relation" qualifier="journalWebOfScienceCategory">Chemistry,&#x20;Multidisciplinary</dcvalue>
<dcvalue element="relation" qualifier="journalWebOfScienceCategory">Chemistry,&#x20;Physical</dcvalue>
<dcvalue element="relation" qualifier="journalWebOfScienceCategory">Nanoscience&#x20;&amp;&#x20;Nanotechnology</dcvalue>
<dcvalue element="relation" qualifier="journalWebOfScienceCategory">Materials&#x20;Science,&#x20;Multidisciplinary</dcvalue>
<dcvalue element="relation" qualifier="journalWebOfScienceCategory">Physics,&#x20;Applied</dcvalue>
<dcvalue element="relation" qualifier="journalWebOfScienceCategory">Physics,&#x20;Condensed&#x20;Matter</dcvalue>
<dcvalue element="relation" qualifier="journalResearchArea">Chemistry</dcvalue>
<dcvalue element="relation" qualifier="journalResearchArea">Science&#x20;&amp;&#x20;Technology&#x20;-&#x20;Other&#x20;Topics</dcvalue>
<dcvalue element="relation" qualifier="journalResearchArea">Materials&#x20;Science</dcvalue>
<dcvalue element="relation" qualifier="journalResearchArea">Physics</dcvalue>
<dcvalue element="type" qualifier="docType">Article</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">GATE&#x20;DIELECTRICS</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">CRYSTALLINE&#x20;BEO</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">MOBILITY</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">SEMICONDUCTORS</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">STABILITY</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">OXYGEN</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">oxide&#x20;semiconductor</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">beryllium&#x20;oxide&#x20;(BeO)</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">thin-film&#x20;transistor&#x20;(TFT)</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">hetero-dielectric</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">hafnium&#x20;dioxide&#x20;(HfO2)</dcvalue>
</dublin_core>
