Jung, Myeong Jun Eun, Su Min Kim, Hogyoung Kim, Seong Keun Byun, Jongmin Choi, Byung Joon 2025-08-26T02:31:06Z 2025-08-26T02:31:06Z 2025-08-20 2025-12 0256-1115 https://pubs.kist.re.kr/handle/201004/153042 SnSe is a promising thermoelectric material with excellent performance, but its practical use is limited by poor mechanical properties and challenges in mass production. Improving polycrystalline SnSe has been the focus, with grain boundary engineering via atomic layer deposition (ALD) emerging as an effective approach. ALD introduces interfacial layers that reduce thermal conductivity through phonon scattering and enhance the Seebeck coefficient via energy-filtering effects. In this study, ZnO thin films were uniformly deposited on SnSe powders using ALD, and their microstructure and chemical properties were analyzed. Thermoelectric evaluations showed a 45% improvement in the figure of merit for ZnO-coated SnSe pellets. Transmission electron microscopy revealed that the thickness and crystallinity of the ZnO film play a critical role in enhancing thermoelectric performance, highlighting the importance of interfacial engineering for optimizing SnSe-based thermoelectric materials. English 한국화학공학회 Thermal Confinement and Filtering Effect of SnSe by Insertion of Atomic-Layer-Deposited ZnO Interfacial Layer Article 10.1007/s11814-025-00540-y 1 Korean Journal of Chemical Engineering, v.42, no.14, pp.3545 - 3554 Korean Journal of Chemical Engineering 42 14 3545 3554 N scie scopus kci ART003270347 001547682100001 2-s2.0-105012628329 Chemistry, Multidisciplinary Engineering, Chemical Chemistry Engineering Article OXIDE ALD THIN-FILMS THERMOELECTRIC PERFORMANCE XPS OXYGEN SnSe Atomic layer deposition Thermoelectric materials Zinc oxide