Moon, Ji-Yun Kim, Do-Hoon Kim, Seung-Il Hwang, Hyun-Sik Choi, Jun-Hui Heyong, Seok-Ki Ghods, Soheil Park, Hyeong Gi Kim, Eui-Tae Bae, Sukang Lee, Seoung-Ki Son, Seok-Kyun Lee, Jae-Hyun 2024-01-12T02:35:55Z 2024-01-12T02:35:55Z 2022-10-23 2022-11 2590-2393 https://pubs.kist.re.kr/handle/201004/75961 Transition-metal dichalcogenides (TMDCs), whose physical proper-ties can be modified by the number of layers within the atomic thick-ness range, are emerging as an essential active interlayer for nano -electronic devices based on van der Waals (vdW) heterostructures. Here, we show the atomic spalling of vdW crystals that achieves large-area TMDCs with a controlled number of layers. Unlike 3D co-valent network solids, the TMDCs are layered crystals featuring strong in-plane covalent bonding and weak out-of-plane vdW inter-action, which allow the crack propagation depth to be reduced to the atomic scale. By adjusting the residual stress of the stressor film, we controlled the crack propagation depth at a scale corre-sponding to the monolayer thickness of the TMDCs. Consequently, mono-, bi-, and trilayer TMDCs were selectively separated from the vdW crystals. The presented results show huge potential for the manufacture of layer-engineered, high-quality vdW materials, which can be developed into functional optoelectronic devices. English Cell Press Layer-engineered atomic-scale spalling of 2D van der Waals crystals Article 10.1016/j.matt.2022.07.021 1 Matter, v.5, no.11, pp.3935 - 3946 Matter 5 11 3935 3946 N scie scopus 000882061900005 Materials Science, Multidisciplinary Materials Science Article MONOLAYER MOS2 VAPOR-DEPOSITION PHOTOLUMINESCENCE EXFOLIATION CRACKING GROWTH ENERGY FILMS