Kim, Yong Tae 2024-01-12T10:41:20Z 2024-01-12T10:41:20Z 2022-01-14 1999-05-18 https://pubs.kist.re.kr/handle/201004/84918 Improvement in diffusion barrier properties of PECVD W-N thin film by low energy BF2+ implantation Conference 1 , pp.0 0 0 The EOS/SPIE Symp. on Microelectronics Manufacturing Technologies