Choi, Won Jun Lee, Seok 2024-01-12T11:41:31Z 2024-01-12T11:41:31Z 2022-01-14 1994-01-01 https://pubs.kist.re.kr/handle/201004/86037 Quantum well disordering by using plasma enhanced chemical vapor deposited SiNx film as a capping layer Conference 1 China, pp.0 China 0 0 1st Korea-Chinese semiconductor conference - 직접입력