Kim Ki Hyuk Cho Jung-gyn Park, Min-Chul Ju, Byeong-Kwon Cho Sung-jin Son, Jung-Young 2024-01-12T18:35:41Z 2024-01-12T18:35:41Z 2021-09-29 https://pubs.kist.re.kr/handle/201004/93957 English extreme ultraviolet lithography mask inspection stereoscopic microscopy Coherent scattering stereoscopic microscopy for mask inspection of extreme ultra-violet lithography Conference 1 SPIE Defense Security and Sensing SPIE Defense Security and Sensing US