SOLID-PHASE EPITAXIAL REGROWTH AND DOPANT ACTIVATION OF P-IMPLANTED METASTABLE PSEUDOMORPHIC GE0.12SI0.88 ON SI(100) - LIE, DYC; THEODORE, ND; SONG, JH; NICOLET, MA (AMER INST PHYSICS, 1995)
Keywords: SI1-XGEX ALLOY LAYERS; ION-IMPLANTATION; DAMAGE PRODUCTION; SI; SILICON; STRAIN; SUPERLATTICES; KINETICS; STRESS; FILMS