ADVANTAGE OF RAPID THERMAL ANNEALING OVER FURNACE ANNEALING FOR P-IMPLANTED METASTABLE SI/GE0.12SI0.88 - LIE, DYC; SONG, JH; NICOLET, MA; THEODORE, ND (AMER INST PHYSICS, 1995)
Keywords: SI1-XGEX; STRAIN; FILMS; SI