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dc.contributor.authorSeongpil Chang-
dc.contributor.authorSong, Yong-Won-
dc.contributor.authorSe-Han Lee-
dc.contributor.authorLee Sang Yeol-
dc.contributor.authorByeong-Kwon Ju-
dc.date.accessioned2024-01-13T04:00:51Z-
dc.date.available2024-01-13T04:00:51Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/102210-
dc.languageEnglish-
dc.subjectZnO-TFT-
dc.subjectHfO2-
dc.subjectAl2O3-
dc.subjectInterfacial layer-
dc.titleRole of Al2O3 buffer layer in ZnO-based trransparent thin film transistors with HfO2 gate-insulator-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationIS-TCO 2008, pp.6-
dc.citation.titleIS-TCO 2008-
dc.citation.startPage6-
dc.citation.endPage6-
dc.citation.conferencePlaceGR-
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