Improvement of W-N films Using WF6 Pulse Plasma Atomic Layer Deposition

Authors
Hyun Sang SimPark Ji HoKim, Seong IlKim, Yong Tae
Citation
International Conference on Electrical Engineering 2004, v.1, pp.333 - 336
URI
https://pubs.kist.re.kr/handle/201004/105569
Appears in Collections:
KIST Conference Paper > Others
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