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A new atomic layer deposition of tungsten nitride diffusion barrier with NH₃ pulse plasma and WF6 gas

Authors

Kim, Yong Tae; Hyun Sang Sim; Kim, Seong Il

Citation

203rd Meeting of the Electrochemical Society, pp.no.408

URI

https://pubs.kist.re.kr/handle/201004/105910

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KIST Conference Paper > Others

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