New model for low frequency noise in poly-Si resistors

Authors
Lee, Jung IlHan, Il KiSookyung ChangEunkyu Kim
Citation
International Women's Conference on BIEN Technology, pp.408 - 409
Keywords
low frequency noise; poly-Si resistors; thermal activation; tunneling; random walk of electrons; thermionic emission
URI
https://pubs.kist.re.kr/handle/201004/105953
Appears in Collections:
KIST Conference Paper > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE