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Diamond thick film deposition in wafer scale using single-cathode direct current (DC) plasma assistedschemical vapour deposition(PACVD).

Authors

Baik Young Joon; 채기웅; Lee Wook Seong

Citation

The 6th APCPST, 15th SPSM, and 11th KAPRA

URI

https://pubs.kist.re.kr/handle/201004/106798

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KIST Conference Paper > Others

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