KIST Library Institutional Repository

An analytical model for intrinsic residual stress effect on out-of-plane chemical-vapor-deposited free-standing thick film.

Authors

정증현; Baik Young Joon; 권동길

Citation

Materials Research Society symposia proceedings, v.v. 695, pp.285 - 290.

URI

https://pubs.kist.re.kr/handle/201004/106810

Appears in Collections:

KIST Conference Paper > Others

Files in This Item:

There are no files associated with this item.

Export

RIS (EndNote)

XLS (Excel)

XML