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Characteristics of W-N diffusion barrier by atomic layer chemical vapor deposition

Authors

심현상; Kim Yong Tae; 전형탁

Citation

제9회 한국반도체학술대회, pp.611 - 612

Keywords

원자층증착; W-N확산방지막; 초고집적소자; 열적안정성

URI

https://pubs.kist.re.kr/handle/201004/107109

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KIST Conference Paper > Others

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