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dc.contributor.authorHAN SUNG HAN-
dc.contributor.author안창규-
dc.contributor.author최승철-
dc.date.accessioned2024-01-13T14:00:20Z-
dc.date.available2024-01-13T14:00:20Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/107513-
dc.languageEnglish-
dc.subjectAIN-
dc.subjectMOCVD-
dc.subjectsingle precursor-
dc.subjectc-axis oriented-
dc.titleDeposition of aluminum nitride thin film by MOCVD using AlCl₃ : BuNH₂ single source precursor-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationProceedings of 14th International Symposium on the Photo Chemistry and Photophysics of Coordination, pp.?-
dc.citation.titleProceedings of 14th International Symposium on the Photo Chemistry and Photophysics of Coordination-
dc.citation.startPage?-
dc.citation.conferencePlaceJA-
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