Effects of Bi content on electrical properties of Pt/SrBi//2Nb//2O//9/Si ferroelectric gate structure

Authors
Kim Yong TaeKim Seong Il최훈상KIM CHUN KEUN이창우
Citation
2001 Korea-japan Joint Workshop on Advanced Semiconductor Process and Equipment, pp.9 - 12
Keywords
SBN
URI
https://pubs.kist.re.kr/handle/201004/107565
Appears in Collections:
KIST Conference Paper > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE