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Reliability of Cu/W-N thin films deposited on low dielectric constant SiO:F ILD

Authors

이석형; 김동준; 양성훈; 박정원; 손세일; 오경희; Kim Yong Tae; 박종완

Citation

MRS 98', pp.?

Keywords

Low-K

URI

https://pubs.kist.re.kr/handle/201004/110172

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KIST Conference Paper > Others

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