DSpace at KIST: Low temperature preparation of SiO2 films with low interface trap density using diffusion and CVD method

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DC Field	Value	Language
dc.contributor.author	JEON BUP JU	-
dc.contributor.author	Lim Tae Hoon	-
dc.contributor.author	Oh In Hwan	-
dc.date.accessioned	2024-01-13T21:32:05Z	-
dc.date.available	2024-01-13T21:32:05Z	-
dc.date.created	2021-09-29	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/111628	-
dc.language	English	-
dc.title	Low temperature preparation of SiO2 films with low interface trap density using diffusion and CVD method	-
dc.type	Conference	-
dc.description.journalClass	1	-
dc.identifier.bibliographicCitation	IEEE conference on optoelectronic and microelectronic materials and devices, Canberra, Australia	-
dc.citation.title	IEEE conference on optoelectronic and microelectronic materials and devices, Canberra, Australia	-
dc.citation.conferencePlace	AT	-

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