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Electrical characteristics of silicon oxide films prepared by chemical vapor deposition method using ECR plama sources.

Other Titles

ECR 플라즈마를 이용한 화학증착법에 의해 제조된 실리콘 산화막의 전기적 특성 =

Authors

JEON BUP JU; 허정수; 윤용수; 정일현; Oh In Hwan; Lim Tae Hoon

Citation

Theories and applications of chem. res., v.v. 2, no.no. 2, pp.2523 - ?

URI

https://pubs.kist.re.kr/handle/201004/111663

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KIST Conference Paper > Others

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